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Niobium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic

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  • Price:

    Negotiable

  • minimum:

  • Total supply:

  • Delivery term:

    The date of payment from buyers deliver within days

  • seat:

    Shaanxi

  • Validity to:

    Long-term effective

  • Last update:

    2018-01-19 10:46

  • Browse the number:

    298

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Haohai Metal Materials Co., Ltd.
Contactaixin:

Contactaixin:

haohaijinshu(Mr.)  

Email:

telephone:

phone:

Area:

Shaanxi

Address:

Plant No.19, TusPark, Century Avenue, Xianyang City, Shaanxi Pro., 712000, China

Website:

http://www.pvdtarget.com/ http://www.disigncn.com/com/haohaijinshu/

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Niobium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron NB Sputtering Targets Manufacturer and Supplier


NIOBIUM SPUTTERING TARGET


Haohai is a professional manufacturer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers for thin film applications.

 

Haohai niobium sputtering targets include niobium monolithic rotatable sputtering targets, niobium planar sputtering targets and niobium cathodic targets.



 

Niobium Monolithic Cylindrical (rotary, rotatable) Sputtering Target

 

Manufacturing Range

OD (mm) ID (mm) Length (mm) Custom Made
50 - 300 30 - 280 100 - 4000


Specification

Composition Nb
Purity 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density 8.58 g/cm3
Grain Sizes < 80 micron or on request
Fabrication Processes Electron beam (EB) Melting, Forging, Extruding, Machining
Shape Straight, Dog Bone
End Types SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Surface Ra 1.6 micron or on request

 

Other Specification

✦ Vapor degreased and demagnetized after final machining

✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

 

Normal Sizes


Niobium Rotary 

Sputtering Target

Normal Sizes

  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long


Compared to planar configurations, Haohai cylindrical sputtering targets offer:

Larger erosion zones that provide 2 to 2.5 times the material utilization.

Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

Custom manufacturing in monolithic, segmented or thermal spray formats.

 End features that are precision machined for individual cathode system designs.

 Reduce the cost of ownership for large area coating operations.

✦ Variety of materials including.

✦ Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

✦ Complete homogeneity and high purity levels produce consistent coverage.

✦ Able to supply materials to any size operation from R&D to full-scale production.



 

Niobium Planar (rectangle, circular) Sputtering Target

 

Manufacturing Range

Rectangle Length (mm) Width (mm) Thickness (mm) Custom Made
10 - 2000 10 - 800 1.0 - 25
Circular Diameter (mm)
Thickness (mm)
10 - 1000
1.0 - 50


Specification

Composition Nb
Purity 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density 8.58 g/cm3
Grain Sizes < 80 micron or on request
Fabrication Processes Electron beam (EB) Melting, Forging, rolling, Machining
Shape Plate, disc, step, custom made
Types Monolithic, multi-segmented target
Surface Ra 1.6 micron or on request


Other Specifications

We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.

 



Niobium arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets



For our Niobium Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or request.


Impurities Content [ppm]

http://www.pvdtarget.com/